Edward M. Nadgorny - Research Projects
Selective Dislocation Etching Study
Etching processes near and at dislocations are quite different than those of an ideal perfect crystal. Therefore,
investigating and understanding the fundamental processes and mechanisms responsible for selective etching of
dislocations in real materials are of great importance.
- The selective etching of dislocations is studied in semiconductors and
intermetallics .
- One of the objectives of the study is to gain further understanding of the critical relationship between the
RIE plasma parameters and the etching properties of real semiconductor materials
(such as structurally modified silicon), which is a vital part of any processing designed for nanoscale electronic
devices of the next future.
- Other objective is to develop chemical solutions able to etch selectively novel materials to reveal dislocation
etch pits, orientation figures and other imperfections.
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